RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)

RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80
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Guarantor: Mgr. Marek Eliáš, Ph.D.
Technologie / Metodologie: Etching & Deposition
Instrument status: Operational Operational, 25.3.2025 15:09
Equipment placement: CEITEC Nano - C1.34
Výzkumná skupina: CF: CEITEC Nano
Upcoming trainings: 3.4. 10:00 - 12:00: RIE-flourine-training -


Popis:

Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.
A typical (parallel plate) RIE system consists of a cylindrical vacuum chamber, with a wafer platter situated in the bottom portion of the chamber. The wafer platter is electrically isolated from the rest of the chamber. Gas enters through small inlets in the top of the chamber and exits to the vacuum pump system through the bottom. The types and amount of gas used vary depending upon the etch process; for instance, sulfur hexafluoride is commonly used for etching silicon. Gas pressure is typically maintained in a range between a few millitorrs and a few hundred millitorrs by adjusting gas flow rates and/or adjusting an exhaust orifice.


Publications:

  • MIGLIACCIO, L.; SAY, M.; PATHAK, G.; GABLECH, I.; BRODSKÝ, J.; DONAHUE, M.; GLOWACKI, E., 2025: Ultrathin Indium Tin Oxide Accumulation Mode Electrolyte-Gated Transistors for Bioelectronics. ADVANCED MATERIALS TECHNOLOGIES , p. 2302219 - 9, doi: 10.1002/admt.202302219; FULL TEXT
    (SUSS-MA8, RIE-FLUORINE, PARYLENE-DIENER, KEITHLEY-4200)
  • Krčma, J., 2024: Controlled Excitation of Magnons through Optically Induced Mie Resonances in Periodic Dielectric Nanostructures. BACHELOR´S THESIS ; FULL TEXT
    (EVAPORATOR, RAITH, RIE-FLUORINE, KAUFMAN, BRILLOUIN, VERIOS)
  • JAKEŠOVÁ, M.; KUNOVSKÝ, O.; GABLECH, I.; KHODAGHOLY, D.; GELINAS, J.; GLOWACKI, E., 2024: Coupling of photovoltaics with neurostimulation electrodes-optical to electrolytic transduction. JOURNAL OF NEURAL ENGINEERING 21(4), doi: 10.1088/1741-2552/ad593d; FULL TEXT
    (PARYLENE-SCS, MAGNETRON, SUSS-MA8, EVAPORATOR, RIE-FLUORINE, DIENER, WIRE-BONDER)
  • GRYSZEL, M.; JAKEŠOVÁ, M.; VU, X.; INGEBRANDT, S.; GLOWACKI, E., 2024: Elevating Platinum to Volumetric Capacitance: High Surface Area Electrodes through Reactive Pt Sputtering. ADVANCED HEALTHCARE MATERIALS , doi: 10.1002/adhm.202302400; FULL TEXT
    (EVAPORATOR, DEKTAK, RIE-FLUORINE, DWL, SUSS-MA8)
  • Liu, X.; Fohlerová, Z.; Gablech, I.; Pumera, M.; Neužil, P., 2024: Nature-inspired parylene/SiO2 core-shell micro-nano pillars: Effect of topography and surface chemistry. APPLIED MATERIALS TODAY 37, doi: 10.1016/j.apmt.2024.102117; FULL TEXT
    (RIE-FLUORINE, DRIE, PARYLENE-SCS, XEF2)

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