Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)

CONTACT US

Guarantor: Ing. Josef Polčák, Ph.D.
Instrument status: Operational Operational, 1.4.2025 11:54
Equipment placement: CEITEC Nano - C1.38
Výzkumná skupina: CF: CEITEC Nano


Popis:

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Publications:

  • JAKUB, Z.; TRLLOVÁ SHAHSAVAR, A.; PLANER, J.; HRŮZA, D.; HERICH, O.; PROCHÁZKA, P.; ČECHAL, J., 2024: How the Support Defines Properties of 2D Metal-Organic Frameworks: Fe-TCNQ on Graphene versus Au(111). JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 146(5), p. 3471 - 12, doi: 10.1021/jacs.3c13212; FULL TEXT
    (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
  • KRAJŇÁK, T.; STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2024: Robust Dipolar Layers between Organic Semiconductors and Silver for Energy-Level Alignment. ACS APPLIED MATERIALS & INTERFACES 16(14), p. 18099 - 13, doi: 10.1021/acsami.3c18697; FULL TEXT
    (UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM, UHV-DEPOSITION)
  • PROCHÁZKA, P.; ČECHAL, J., 2024: ProLEED Studio: software for modeling low-energy electron diffraction patterns. JOURNAL OF APPLIED CRYSTALLOGRAPHY 57(1), p. 187 - 7, doi: 10.1107/S1600576723010312; FULL TEXT
    (UHV-LEEM, UHV-PREPARATION)
  • PROCHÁZKA, P.; ČECHAL, J., 2023: Visualization of molecular stacking using low-energy electron microscopy. ULTRAMICROSCOPY 253, doi: 10.1016/j.ultramic.2023.113799; FULL TEXT
    (UHV-DEPOSITION, UHV-LEEM, UHV-PREPARATION, UHV-SPM)
  • Kurowská, A., 2023: 2D metal-organic frameworks from organic carbonitrile molecules on weakly interacting substrates. MASTER´S THESIS , p. 1 - 61; FULL TEXT
    (UHV-LEEM, UHV-MBE, UHV-PREPARATION, UHV-SPM, UHV-XPS)

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